Particles in Gases and Liquids 2 : Detection, Characterization, and Control - neues Buch

EAN (ISBN-13): 9781489935441
Erscheinungsjahr: 2013
Herausgeber: Springer US

Buch in der Datenbank seit 2016-11-27T09:10:15+01:00 (Berlin)
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ISBN/EAN: 9781489935441

ISBN - alternative Schreibweisen:
978-1-4899-3544-1
Alternative Schreibweisen und verwandte Suchbegriffe:
Autor des Buches: marijane meaker

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Daten vom Verlag:

Autor/in: K.L. Mittal
Titel: Particles in Gases and Liquids 2 - Detection, Characterization, and Control
Verlag: Springer; Springer US
408 Seiten
Erscheinungsjahr: 2013-11-11
New York; NY; US
Sprache: Englisch
149,79 € (DE)
154,00 € (AT)
177,00 CHF (CH)
Available
X, 408 p.

EA; E107; eBook; Nonbooks, PBS / Chemie/Physikalische Chemie; Physikalische Chemie; Verstehen; aerosol; Diffusion; water; C; Physical Chemistry; Physical Chemistry; Chemistry and Materials Science; BB

General Overview Papers.- Modeling of Particle Deposition in Cleanroom Environments: Current Status.- Sampling of Airborne Particles for Contamination Assessment.- The Role of Bacterial Biofilms in Contamination of Process Fluids by Biological Particulates.- Describing Filters and Filtration Processes Using the Concepts of Fractal Geometry.- Detection and Control of Particles in Vacuum Environments for Semiconductor Processing.- Operator-Generated Particles: Characterization, Monitoring and Control.- Building and Using an Application-Specific Particle Atlas.- Particulate Cleanliness Testing of Filters and Equipment in Process Fluids (Gas or Liquid).- Optical Particle Counter Performance Definitions Effects on Submicrometer Particle Measurement.- Particle Generation and Deposition.- Assessing Wiping Materials for their Potential to Contribute Particles to Clean Environments: A Novel Approach.- Robots as a Potential Source of Particulate Contamination.- Particle Release from Surfaces by Mechanical Shocks.- Flowrate Dependence of Particle Shedding from a Gas Delivery Line.- Apparatus for Measuring Ultrafine Particle Emissions from Air Ionization Equipment.- Measurement of Submicrometer Particle Deposition on Silicon Wafers in Cleanroom Environment.- Particles in Gases: Detection, Characterization and Control.- Characterization of Individual Particles in Gaseous Media by Mass Spectrometry.- Characterization of Particles in High-Purity Gases.- Particle Measurement in Gas System Components: Defining a Practical Test Method.- Real-Time Measurement of Particulate Levels in Gases in a Production Diffusion Environment.- In-Situ Particle Monitoring in a Plasma Etcher.- Protected Particle Collection from Gas Streams for Characterization by Analytical Electron Microscopy.- Photoacoustic Detection of Radiation Absorbing Particles in Gases.- Transport of Charged Particles in Gas Streams.- Resolution, Sensitivity, Counting Efficiency, and Coincidence Limit of Optical Aerosol Particle Counters.- Particles in Liquids: Detection Characterization and Control.- Characterization of the Particle Loading in Deionized Water Systems by Automated SEM Analysis.- A Sensitive Monitor for Particles in Liquids.- New Techniques for Sampling Submicron Particle Contamination in Water.- Scaling Laws for Rayleigh Particle Detection in Liquids.- Removal of Particles from Deionized Water in a Recirculating Bath by Etchant Filters.- Modelling of Particle Removal from a Circulating Etch Bath.- Packaging High Purity Chemicals to Ensure Low Particulate Contamination at Point-of-Use.