ISBN: 0819475602

[SR: 3209179], Hardcover, [EAN: 9780819475602], SPIE Press, SPIE Press, Book, [PU: SPIE Press], SPIE Press, This book is aimed at new and experienced engineers, technology managers, and s… Mehr…

[SR: 3209179], Hardcover, [EAN: 9780819475602], SPIE Press, SPIE Press, Book, [PU: SPIE Press], SPIE Press, This book is aimed at new and experienced engineers, technology managers, and senior technicians who want to enrich their understanding of the image formation physics of a lithographic system. Readers will gain knowledge of the basic equations and constants that drive optical lithography, learn the basics of exposure systems and image formation, and come away with a full understanding of system components, processing, and optimization. Readers will also get a primer on the outlook of optical lithography and the many next-generation technologies that may greatly enhance semiconductor manufacturing in the near future. Topics include:- Exposure Systems- Image Formation- The Meter of Lithography- Components in Optical Lithography- Processing and Optimization- Immersion Lithography- Outlook for optical lithography, 13698, Circuits, 107178011, Design, 107179011, Integrated, 7921648011, Logic, 7921649011, VLSI & ULSI, 227544, Electrical & Electronics, 173515, Engineering, 173507, Engineering & Transportation, 1000, Subjects, 283155, Books, 13769, Manufacturing, 227550, Industrial, Manufacturing & Operational Systems, 173515, Engineering, 173507, Engineering & Transportation, 1000, Subjects, 283155, Books, 14589, Optics, 14545, Physics, 75, Science & Math, 1000, Subjects, 283155, Books, 465600, New, Used & Rental Textbooks, 468220, Business & Finance, 468226, Communication & Journalism, 468204, Computer Science, 468224, Education, 468212, Engineering, 468206, Humanities, 468222, Law, 468228, Medicine & Health Sciences, 684283011, Reference, 468216, Science & Mathematics, 468214, Social Sciences, 684300011, Test Prep & Study Guides, 2349030011, Specialty Boutique, 283155, Books<

ISBN: 9780819475602

This book is aimed at new and experienced engineers, technology managers, and senior technicians who want to enrich their understanding of the image formation physics of a lithographic sy… Mehr…

This book is aimed at new and experienced engineers, technology managers, and senior technicians who want to enrich their understanding of the image formation physics of a lithographic system. Readers will gain knowledge of the basic equations and constants that drive optical lithography, learn the basics of exposure systems and image formation, and come away with a full understanding of system components, processing, and optimization. Readers will also get a primer on the outlook of optical lithography and the many next-generation technologies that may greatly enhance semiconductor manufacturing in the near future. Burn Lin is editor-in-chief of the Journal of Micro/Nanolithography, MEMS, and MOEMS (JM3), past chair of the SPIE Advanced Lithography symposium, author of two book chapters and over 88 articles, and holder of 51 U.S. patents. He is a National Academy of Engineering member, SPIE fellow, and IEEE fellow. Technology Technology eBook, SPIE<

ISBN: 9780819475602

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